Special Section on Alternative Lithographic Technologies IV

Advanced electric-field scanning probe lithography on molecular resist using active cantilever

[+] Author Affiliations
Marcus Kaestner, Cemal Aydogan, Tzvetan Ivanov, Ahmad Ahmad, Tihomir Angelov, Valentyn Ishchuk, Yana Krivoshapkina, Steve Lenk, Ivo W. Rangelow

Ilmenau University of Technology, Institute of Micro and Nanoelectronics, Department of Micro- and Nanoelectronic Systems, Faculty of Electrical Engineering and Information Technology, Gustav-Kirchhoff-Straße 1, Ilmenau 98693, Germany

Alexander Reum, Manuel Hofer, Ivaylo Atanasov

Ilmenau University of Technology, Institute of Micro and Nanoelectronics, Department of Micro- and Nanoelectronic Systems, Faculty of Electrical Engineering and Information Technology, Gustav-Kirchhoff-Straße 1, Ilmenau 98693, Germany

Nano Analytik GmbH, Ehrenbergstraße 11, Ilmenau 98693, Germany

Mathias Holz

Nano Analytik GmbH, Ehrenbergstraße 11, Ilmenau 98693, Germany

J. Micro/Nanolith. MEMS MOEMS. 14(3), 031202 (Jun 10, 2015). doi:10.1117/1.JMM.14.3.031202
History: Received March 8, 2015; Accepted May 4, 2015
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Abstract.  The routine “on demand” fabrication of features smaller than 10 nm opens up new possibilities for the realization of many devices. Driven by the thermally actuated piezoresistive cantilever technology, we have developed a prototype of a scanning probe lithography (SPL) platform which is able to image, inspect, align, and pattern features down to the single digit nanoregime. Here, we present examples of practical applications of the previously published electric-field based current-controlled scanning probe lithography. In particular, individual patterning tests are carried out on calixarene by using our developed table–top SPL system. We have demonstrated the application of a step-and-repeat SPL method including optical as well as atomic force microscopy-based navigation and alignment. The closed-loop lithography scheme was applied to sequentially write positive and negative tone features. Due to the integrated unique combination of read–write cycling, each single feature is aligned separately with the highest precision and inspected after patterning. This routine was applied to create a pattern step by step. Finally, we have demonstrated the patterning over larger areas, over existing topography, and the practical applicability of the SPL processes for lithography down to 13-nm pitch patterns. To enhance the throughput capability variable beam diameter electric field, current-controlled SPL is briefly discussed.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Marcus Kaestner ; Cemal Aydogan ; Tzvetan Ivanov ; Ahmad Ahmad ; Tihomir Angelov, et al.
"Advanced electric-field scanning probe lithography on molecular resist using active cantilever", J. Micro/Nanolith. MEMS MOEMS. 14(3), 031202 (Jun 10, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.3.031202


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