Special Section on Alternative Lithographic Technologies IV

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

[+] Author Affiliations
Hari Pathangi, Boon Teik Chan, Hareen Bayana, Nadia Vandenbroeck, Dieter Van Den Heuvel, Lieve Van Look, Paulina Rincon-Delgadillo, Roel Gronheid

IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

Yi Cao, JiHoon Kim, Guanyang Lin

EMD Performance Materials Corp., 70 Meister Avenue, Somerville, New Jersey 08876, United States

Doni Parnell

Tokyo Electron Europe Limited, Kerkenbos 10-15 Unit C, 6546 BB Nijmegen, The Netherlands

Kathleen Nafus

Tokyo Electron America, Inc., 2400 Grove Boulevard, Austin, Texas 78741, United States

Ryota Harukawa, Ito Chikashi, Marco Polli

KLA-Tencor Corporation, 1 Technology Drive, Milpitas, California 95035, United States

Lucia D’Urzo

Entegris® GmbH, Hugo-Junkers-Ring 5, Gebäude 107/W, Dresden 01109, Germany

Paul Nealey

Institute for Molecular Engineering, University of Chicago, 5747 South Ellis Avenue, Chicago, Illinois 60637, United States

J. Micro/Nanolith. MEMS MOEMS. 14(3), 031204 (Jul 02, 2015). doi:10.1117/1.JMM.14.3.031204
History: Received May 1, 2015; Accepted June 2, 2015
Text Size: A A A

Abstract.  High-defect density in thermodynamics driven directed self-assembly (DSA) flows has been a major cause of concern for a while and several questions have been raised about the relevance of DSA in high-volume manufacturing. The major questions raised in this regard are: (1) What is the intrinsic level of DSA-induced defects? (2) Can we isolate the DSA-induced defects from the other processes-induced defects? (3) How much do the DSA materials contribute to the final defectivity and can this be controlled? (4) How can we understand the root causes of the DSA-induced defects and their kinetics of annihilation? (5) Can we have block copolymer anneal durations that are compatible with standard CMOS fabrication techniques (in the range of minutes) with low-defect levels? We address these important questions and identify the issues and the level of control needed to achieve a stable DSA defect performance.

© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Hari Pathangi ; Boon Teik Chan ; Hareen Bayana ; Nadia Vandenbroeck ; Dieter Van Den Heuvel, et al.
"Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow", J. Micro/Nanolith. MEMS MOEMS. 14(3), 031204 (Jul 02, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.3.031204


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