Lithography

More systematic errors in the measurement of power spectral density

[+] Author Affiliations
Chris A. Mack

Lithoguru.com, 1605 Watchhill Road, Austin, Texas 78703, United States

J. Micro/Nanolith. MEMS MOEMS. 14(3), 033502 (Jul 14, 2015). doi:10.1117/1.JMM.14.3.033502
History: Received May 12, 2015; Accepted June 17, 2015
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Abstract.  Power spectral density (PSD) analysis is an important part of understanding line-edge and linewidth roughness in lithography. But uncertainty in the measured PSD, both random and systematic, complicates interpretation. It is essential to understand and quantify the sources of the measured PSD’s uncertainty and to develop mitigation strategies. Both analytical derivations and simulations of rough features are used to evaluate data window functions for reducing spectral leakage and to understand the impact of data detrending on biases in PSD, autocovariance function (ACF), and height-to-height covariance function measurement. A generalized Welch window was found to be best among the windows tested. Linear detrending for line-edge roughness measurement results in underestimation of the low-frequency PSD and errors in the ACF and height-to-height covariance function. Measuring multiple edges per scanning electron microscope image reduces this detrending bias.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Chris A. Mack
"More systematic errors in the measurement of power spectral density", J. Micro/Nanolith. MEMS MOEMS. 14(3), 033502 (Jul 14, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.3.033502


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