Molecular dynamics simulation on selective etching of α-quartz and amorphous quartz substrate using low-energy argon ion bombardment model in dry etching process

Abdul Haadi Abdul Manap; Khairudin Mohamed

doi:10.1117/1.JMM.14.3.033505

21 July 2015 Molecular dynamics simulation on selective etching of α-quartz and amorphous quartz substrate using low-energy argon ion bombardment model in dry etching process

Abdul Haadi Abdul Manap, Khairudin Mohamed

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 14, Issue 3, 033505 (July 2015). https://doi.org/10.1117/1.JMM.14.3.033505

Abstract

We investigated the physical sputtering of low-energy argon bombardment onto α-quartz and amorphous quartz substrate using dynamics simulations. We reported the effects of etching selectivity, the effect of surface temperature, T_s, and the effect of incident energy, E_i on sputtering yield. The second generation charge-optimized many body (COMB10) potential was utilized to model the interatomic potential of quartz substrates. Simulations were conducted at incident energies of E_i=50, 100, and 150 eV and substrate temperatures of T_s=300, 500, and 800 K. α-quartz shows higher sputtering yield compared to amorphous quartz at any given incident energy, E_i and substrate temperature, T_s. α-quartz has also produced more stoichiometric yield compared to amorphous quartz.

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Abdul Haadi Abdul Manap and Khairudin Mohamed "Molecular dynamics simulation on selective etching of α-quartz and amorphous quartz substrate using low-energy argon ion bombardment model in dry etching process," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(3), 033505 (21 July 2015). https://doi.org/10.1117/1.JMM.14.3.033505

Published: 21 July 2015

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