Lithography

Step-and-repeat nanoimprint on pre-spin coated film for the fabrication of integrated optical devices

[+] Author Affiliations
Giuseppe Calafiore

aBeam Technologies Inc., 22290 Foothill Boulevard, St. 2 Hayward, California 94541, United States

Polytechnic University of Turin, Corso Duca degli Abruzzi 24, Turin 10129, Italy

Molecular Foundry, Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, California 94720, United States

Alexander Koshelev

aBeam Technologies Inc., 22290 Foothill Boulevard, St. 2 Hayward, California 94541, United States

Moscow Institute of Physics and Technology, 9 Institutsky per., Dolgoprudny, Moscow 141700, Russia

Scott Dhuey, Simone Sassolini, Stefano Cabrini

Molecular Foundry, Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, California 94720, United States

Martin Messerschmidt, Ame Schleunitz

Micro Resist Technology GmbH, Köpenicker Strasse 325, Berlin D-12555, Germany

Alexander Goltsov, Vladimir Yankov

Nano-Optic Devices, 2953 Bunker Hill Lane, Santa Clara, California 95054, United States

Carlos Piña-Hernandez, Christophe Peroz

aBeam Technologies Inc., 22290 Foothill Boulevard, St. 2 Hayward, California 94541, United States

Fabrizio C. Pirri

Polytechnic University of Turin, Corso Duca degli Abruzzi 24, Turin 10129, Italy

J. Micro/Nanolith. MEMS MOEMS. 14(3), 033506 (Aug 07, 2015). doi:10.1117/1.JMM.14.3.033506
History: Received May 20, 2015; Accepted July 7, 2015
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Abstract.  A step-and-repeat nanoimprint lithography (SR-NIL) process on a pre-spin-coated film is employed for the fabrication of an integrated optical device for on-chip spectroscopy. The complex device geometry has a footprint of about 3cm2 and comprises several integrated optical components with different pattern size and density. Here, a new resist formulation for SR-NIL was tested for the first time and proved effective at dramatically reducing the occurrence of systematic defects due to film dewetting, trapped bubbles, and resist peel-off. A batch of 180 dies were imprinted, and statistics on the imprint success rate is discussed. Devices were optically characterized and benchmarked to an identical chip that was fabricated by electron-beam lithography. The overall performance of the imprinted nanospectrometers is well-aligned with that of the reference chip, which demonstrates the great potential of our SR-NIL for the low-cost manufacturing of integrated optical devices.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Giuseppe Calafiore ; Alexander Koshelev ; Scott Dhuey ; Simone Sassolini ; Martin Messerschmidt, et al.
"Step-and-repeat nanoimprint on pre-spin coated film for the fabrication of integrated optical devices", J. Micro/Nanolith. MEMS MOEMS. 14(3), 033506 (Aug 07, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.3.033506


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