Special Section on Alternative Lithographic Technologies IV

Directed self-assembly cut mask assignment for unidirectional design

[+] Author Affiliations
Jiaojiao Ou, David Z. Pan

University of Texas at Austin, Department of Electrical and Computer Engineering, Austin, Texas 78712, United States

Bei Yu

University of Texas at Austin, Department of Electrical and Computer Engineering, Austin, Texas 78712, United States

Chinese University of Hong Kong, Department of Computer Science and Engineering, Shatin, Hong Kong

Jhih-Rong Gao

Cadence Design Systems, 12515-7 Research Boulevard, Austin, Texas 78759, United States

J. Micro/Nanolith. MEMS MOEMS. 14(3), 031211 (Aug 07, 2015). doi:10.1117/1.JMM.14.3.031211
History: Received April 15, 2015; Accepted July 8, 2015
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Abstract.  Recently, directed self-assembly (DSA) has emerged as a promising lithography solution for cut manufacturing. We perform a comprehensive study on the DSA aware mask optimization problem to provide a DSA friendly design on cut layers. We first formulate the problem as an integer linear programming (ILP) to assign cuts to different guiding templates, targeting both conflict minimization and line-end extension minimization. As ILP may not be scalable for very large size problems, we then propose two speed-up strategies. The first one is to decompose the initial problem into smaller ones and solve them separately, followed by solution merging without much loss of quality. The second one is using the set cover algorithm to decide the DSA guiding pattern assignment, and then legalize the template placement. Our approaches can be naturally extended to handle arbitrary DSA guiding template patterns with complicated shapes. Experimental results show that our methodologies can significantly improve the DSA friendly, i.e., both the unresolved pattern number and the line-end extensions can be reduced.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Jiaojiao Ou ; Bei Yu ; Jhih-Rong Gao and David Z. Pan
"Directed self-assembly cut mask assignment for unidirectional design", J. Micro/Nanolith. MEMS MOEMS. 14(3), 031211 (Aug 07, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.3.031211


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