11 August 2015 Efficient layout data compression algorithm and its low-complexity, high-performance hardware decoder implementation for multiple electron-beam direct-write systems
Chin-Khai Tang, Ming-Shing Su, Yi-Chang Lu
Author Affiliations +
Abstract
A lossless electron-beam layout (EBL) data compression algorithm, LineDiff Entropy v2.0, and its low-complexity, high-performance hardware decoder for multiple electron-beam direct-write lithography systems are proposed. The algorithm compares consecutive data scanlines and encodes the data based on the change/no-change of pixel values and the lengths of pixel sequences. Then, the compaction steps of data omission, merging, and encoding of consecutive long identical scanlines are applied. Unique short codes are assigned to data with high occurrence frequency. The hardware decoder is designed as three circuit blocks that perform entropy decoding, decompaction, and EBL data generation through parallel outputs. The results demonstrate that our algorithm can achieve excellent compression performance and that the hardware decoder can decompress data at very high data rates.
© 2015 Society of Photo-Optical Instrumentation Engineers (SPIE) 1932-5150/2015/$25.00 © 2015 SPIE
Chin-Khai Tang, Ming-Shing Su, and Yi-Chang Lu "Efficient layout data compression algorithm and its low-complexity, high-performance hardware decoder implementation for multiple electron-beam direct-write systems," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(3), 031212 (11 August 2015). https://doi.org/10.1117/1.JMM.14.3.031212
Published: 11 August 2015
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Electron beam lithography

Data compression

Computer programming

Clocks

Lutetium

Stereolithography

Electroluminescence

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