Lithography

Nanomechanical properties of solvent cast polystyrene and poly(methyl methacrylate) polymer blends and self-assembled block copolymers

[+] Author Affiliations
Matteo Lorenzoni, Laura Evangelio, Francesc Pérez-Murano

Instituto de Microelectrónica de Barcelona (IMB-CNM, CSIC) Campus de la UAB, 08193 Bellaterra, Spain

Célia Nicolet, Christophe Navarro

Arkema France, R.N. 117, BP34-64170 Lacq, France

Alvaro San Paulo

Instituto de Microelectrónica de Madrid (CSIC) Calle de Isaac Newton, 8, 28760 Tres Cantos, Spain

Gemma Rius

Nagoya Institute of Technology, NITech, Gokiso, Showa, 466-8555 Nagoya, Japan

J. Micro/Nanolith. MEMS MOEMS. 14(3), 033509 (Sep 11, 2015). doi:10.1117/1.JMM.14.3.033509
History: Received March 16, 2015; Accepted July 24, 2015
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Abstract.  The nanomechanical properties of solvent-cast polymer thin films have been investigated using PeakForce™ Quantitative Nanomechanical Mapping. The samples consisted of films of polystyrene (PS) and poly(methyl methacrylate) (PMMA) obtained after the dewetting of toluene solution on a polymeric brush layer. Additionally, we have probed the mechanical properties of poly(styrene-b-methyl methacrylate) block copolymers (BCP) as randomly oriented thin films. The probed films have a critical thickness <50nm and present features to be resolved <42nm. The Young’s modulus values obtained through several nanoindentation experiments present a good agreement with previous literature, suggesting that the PeakForce™ technique could be crucial for BCP investigations, e.g., as a predictor of the mechanical stability of the different phases.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Matteo Lorenzoni ; Laura Evangelio ; Célia Nicolet ; Christophe Navarro ; Alvaro San Paulo, et al.
"Nanomechanical properties of solvent cast polystyrene and poly(methyl methacrylate) polymer blends and self-assembled block copolymers", J. Micro/Nanolith. MEMS MOEMS. 14(3), 033509 (Sep 11, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.3.033509


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