Special Section on Alternative Lithographic Technologies IV

Directed self-assembly graphoepitaxy template generation with immersion lithography

[+] Author Affiliations
Yuansheng Ma, Junjiang Lei, Le Hong

Mentor Graphics Corporation, 46885 Bayside Parkway, Fremont, California 94538, United States

J. Andres Torres, James Word, Alexander Tritchkov, George Lippincott, Rachit Gupta, Neal Lafferty, Yuan He

Mentor Graphics Corporation. 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070, United States

Germain Fenger

Mentor Graphics Corporation, Kapledreef 75, Heverlee 3001, Belgium

Joost Bekaert, Geert Vanderberghe

IMEC, Kapeldreef 75, Leuven B-3001, Belgium

J. Micro/Nanolith. MEMS MOEMS. 14(3), 031216 (Sep 11, 2015). doi:10.1117/1.JMM.14.3.031216
History: Received April 28, 2015; Accepted August 4, 2015
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Abstract.  We present an optimization methodology for the template designs of subresolution contacts using directed self-assembly (DSA) with graphoepitaxy and immersion lithography. We demonstrate the flow using a 60-nm-pitch contact design in doublet with Monte Carlo simulations for DSA. We introduce the notion of template error enhancement factor (TEEF) to gauge the sensitivity of DSA printing infidelity to template printing infidelity and evaluate optimized template designs with TEEF metrics. Our data show that source mask optimization and inverse lithography technology are critical to achieve sub-80 nm non-L0 pitches for DSA patterns using 193i.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Yuansheng Ma ; Junjiang Lei ; J. Andres Torres ; Le Hong ; James Word, et al.
"Directed self-assembly graphoepitaxy template generation with immersion lithography", J. Micro/Nanolith. MEMS MOEMS. 14(3), 031216 (Sep 11, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.3.031216


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