Special Section on the Interface of Holography and MEMS

Topography of nanometric thin films with three-wavelength digital interferometry

[+] Author Affiliations
Pascal Picart, Mokrane Malek

Université du Maine, CNRS UMR 6613, LAUM, Avenue Olivier Messiaen, 72085 Le Mans Cedex 9, France

Jorge Garcia-Sucerquia

Université du Maine, CNRS UMR 6613, LAUM, Avenue Olivier Messiaen, 72085 Le Mans Cedex 9, France

Universidad Nacional de Colombia-Sede Medellin, School of Physics, A.A. 3840, Medellin 050034, Colombia

Mathieu Edely, Rahma Moalla, Nicolas Delorme, Jean-François Bardeau

Université du Maine, CNRS UMR 6283, IMMM, Avenue Olivier Messiaen, 72085 Le Mans Cedex 9, France

J. Micro/Nanolith. MEMS MOEMS. 14(4), 041309 (Sep 11, 2015). doi:10.1117/1.JMM.14.4.041309
History: Received May 29, 2015; Accepted August 7, 2015
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Abstract.  This paper discusses a method to measure the thickness of thin layers deposited on a reflective substrate. An interferometer with three wavelengths produces color interferences. A color sensor records the tint that is produced. The color interferences are approximated by a model based on the measurement of the laser intensities obtained with the reference mirror only. An iterative process leads to unambiguous algorithmic convergence and high accuracy thickness measurement. This method is simple, robust, compact, and single shot. The method does not need angular scanning over the field of measurement (about 75mm2). The measurement on the surface yields a histogram of the thickness distribution and there is no requirement for any reference points (e.g., no need to make a groove or a walk on the layer). A thickness measurement performance of 50 nm was demonstrated for homogeneous polymer films deposited on a silicon wafer. The setup and digital image processing are discussed.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Pascal Picart ; Mokrane Malek ; Jorge Garcia-Sucerquia ; Mathieu Edely ; Rahma Moalla, et al.
"Topography of nanometric thin films with three-wavelength digital interferometry", J. Micro/Nanolith. MEMS MOEMS. 14(4), 041309 (Sep 11, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.4.041309


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