Lithography

Organometallic carboxylate resists for extreme ultraviolet with high sensitivity

[+] Author Affiliations
James Passarelli, Michael Murphy, Ryan Del Re, Miriam Sortland, Jodi Hotalen, Levi Dousharm, Robert L. Brainard

State University of New York Polytechnic Institute, Colleges of Nanoscale Science and Engineering, 257 Fuller Road, Albany, New York 12203, United States

Roberto Fallica, Yasin Ekinci

Paul Scherrer Institute, Villigen, Switzerland

Mark Neisser

Sematech, Albany, New York 12203, United States

Daniel A. Freedman

State University of New York, Department of Chemistry, 1 Hawk Drive, New Paltz, New York 12561, United States

J. Micro/Nanolith. MEMS MOEMS. 14(4), 043503 (Oct 14, 2015). doi:10.1117/1.JMM.14.4.043503
History: Received June 16, 2015; Accepted September 10, 2015
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Abstract.  We have developed organometallic carboxylate compounds [RnM(O2CR)2] capable of acting as negative-tone extreme ultraviolet (EUV) resists. The most sensitive of these resists contain antimony, three R-groups and two carboxylate groups, and carboxylate groups with polymerizable olefins (e.g., acrylate, methacrylate, or styrenecarboxylate). Evidence suggests that high sensitivity is achieved through the polymerization of olefins in the exposed region. We have performed a systematic sensitivity study of the molecules of the type RnM(O2CR)2 where we have studied seven R groups, four main group metals (M), and three polymerizable carboxylate groups (O2CR). The sensitivity of these resists was evaluated using Emax or dose to maximum resist thickness after exposure and development. We found that the greatest predictor of sensitivity of the RnSb(O2CR)2 resists is their level of polymerizable olefins. We mathematically define the polymerizable olefin loading (POL) as the ratio of the number of olefins versus the number of nonhydrogen atoms. Linear and log plots of Emax versus POL for a variety of molecules of the type R3Sb(O2CR)2 lend insight into the behavior of these resists.

© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

James Passarelli ; Michael Murphy ; Ryan Del Re ; Miriam Sortland ; Jodi Hotalen, et al.
"Organometallic carboxylate resists for extreme ultraviolet with high sensitivity", J. Micro/Nanolith. MEMS MOEMS. 14(4), 043503 (Oct 14, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.4.043503


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