Lithography

Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging

[+] Author Affiliations
Lina Shen

Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, China

Xinjiang Normal University, Institute of Physics and Electronic Engineering, Xinjiang, Urumchi 830000, China

Sikun Li, Xiangzhao Wang, Guanyong Yan

Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, China

J. Micro/Nanolith. MEMS MOEMS. 14(4), 043504 (Oct 20, 2015). doi:10.1117/1.JMM.14.4.043504
History: Received April 10, 2015; Accepted September 21, 2015
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Abstract.  In high-numerical aperture (NA) and hyper-NA lithography systems, the polarization aberration of the projection lens leads to imaging degradations. Typically, commercial simulators, which usually entail relatively higher computing cost and lack sufficient theoretical support, are used to explore the relationship. Analytical analysis of the impact of polarization aberration of the projection lens on the aerial image is performed. In the analysis process, an alternating phase-shift mask is used, and different components of the linear polarized illumination light vector are considered. The analytical expressions of image placement error (IPE) and best focus shift (BFS) caused by polarization aberration are derived from the intensity of the aerial image. The linear relationships between IPE and odd Pauli-Zernike polarization aberrations as well as that between BFS and even Pauli-Zernike polarization aberrations are established. Moreover, the polarization aberration sensitivities are given and compared when different components of the linear polarized illumination light vector are adopted. All derived expressions match simulation results well and can be used to understand more fully the detrimental impact of polarization aberration on lithographic imaging. The accuracy of the linear relationships is assessed by the least square method.

Figures in this Article
© 2015 Society of Photo-Optical Instrumentation Engineers

Topics

Polarization ; Lenses

Citation

Lina Shen ; Sikun Li ; Xiangzhao Wang and Guanyong Yan
"Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging", J. Micro/Nanolith. MEMS MOEMS. 14(4), 043504 (Oct 20, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.4.043504


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