Lithography

Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates

[+] Author Affiliations
Ryan Del Re, James Passarelli, Miriam Sortland, Brian Cardineau, Robert L. Brainard

College of Nanoscale Science and Engineering, 257 Fuller Road, Albany, New York 12203, United States

Yasin Ekinci, Elizabeth Buitrago

Paul Scherrer Institut, 5232 Villigen PSI, Switzerland

Mark Neisser

Sematech, Albany, New York 12203, United States

Daniel A. Freedman

State University of New York at New Paltz, 1 Hawk Drive, New Paltz, New York 12561, United States

J. Micro/Nanolith. MEMS MOEMS. 14(4), 043506 (Nov 09, 2015). doi:10.1117/1.JMM.14.4.043506
History: Received April 22, 2015; Accepted September 4, 2015
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Abstract.  Pure thin films of organotin compounds have been lithographically evaluated using extreme ultraviolet lithography (EUVL, 13.5 nm). Twenty compounds of the type R2Sn(O2CR)2 were spin-coated from solutions in toluene, exposed to EUV light, and developed in organic solvents. Exposures produced negative-tone contrast curves and dense-line patterns using interference lithography. Contrast-curve studies indicated that the photosensitivity is linearly related to the molecular weight of the carboxylate group bound to tin. Additionally, photosensitivity was found to be linearly related to free radical stability of the hydrocarbon group bound directly to tin (R=phenyl, butyl, and benzyl). Dense-line patterning capabilities varied, but two resists in particular show exceptionally good line edge roughness (LER). A resist composed of an amorphous film of (C6H5CH2)2Sn(O2CC(CH3)3)2 (1) achieved 1.4 nm LER at 22-nm half-pitch patterning and a resist composed of (C6H5CH2)2Sn(O2CC6H5)2 (2) achieved 1.1 nm LER at 35-nm half-pitch at high exposure doses (600mJ/cm2). Two photoresists that use olefin-based carboxylates, (C6H5CH2)2Sn(O2CCHCH2)2 (3) and (C6H5CH2)2Sn(O2CC(CH3)CH2)2 (4), demonstrated better photospeeds (5mJ/cm2 and 27mJ/cm2) but worse LER.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Ryan Del Re ; James Passarelli ; Miriam Sortland ; Brian Cardineau ; Yasin Ekinci, et al.
"Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates", J. Micro/Nanolith. MEMS MOEMS. 14(4), 043506 (Nov 09, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.4.043506


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