Lithography

Design of electrostatic microcolumn for nanoscale photoemission source in massively parallel electron-beam lithography

[+] Author Affiliations
Ye Wen, Zhidong Du, Liang Pan

Purdue University, School of Mechanical Engineering, 585 Purdue Mall, West Lafayette, Indiana 47907, United States

J. Micro/Nanolith. MEMS MOEMS. 14(4), 043508 (Dec 18, 2015). doi:10.1117/1.JMM.14.4.043508
History: Received April 14, 2015; Accepted November 18, 2015
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Abstract.  Microcolumns are widely used for parallel electron-beam lithography because of their compactness and the ability to achieve high spatial resolution. A design of an electrostatic microcolumn for our recent nanoscale photoemission sources is presented. We proposed a compact column structure (as short as several microns in length) for the ease of microcolumn fabrication and lithography operation. We numerically studied the influence of several design parameters on the optical performance such as microcolumn diameter, electrode thickness, beam current, working voltages, and working distance. We also examined the effect of fringing field between adjacent microcolumns during parallel lithography operations.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Ye Wen ; Zhidong Du and Liang Pan
"Design of electrostatic microcolumn for nanoscale photoemission source in massively parallel electron-beam lithography", J. Micro/Nanolith. MEMS MOEMS. 14(4), 043508 (Dec 18, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.4.043508


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