Lithography

Platinum and palladium oxalates: positive-tone extreme ultraviolet resists

[+] Author Affiliations
Miriam Sortland, Jodi Hotalen, Ryan Del Re, James Passarelli, Michael Murphy, Robert L. Brainard

College of Nanoscale Science and Engineering, 257 Fuller Road, Albany, New York 12203, United States

Tero S. Kulmala, Yasin Ekinci

Paul Scherrer Institute, Villigen 5232, Switzerland

Mark Neisser

SUNY Poly SEMATECH, 257 Fuller Road, Suite 2200, Albany, New York 12203, United States

Daniel A. Freedman

State University of New York at New Paltz, 1 Hawk Drive, New Paltz, New York 12561, United States

J. Micro/Nanolith. MEMS MOEMS. 14(4), 043511 (Dec 24, 2015). doi:10.1117/1.JMM.14.4.043511
History: Received July 6, 2015; Accepted November 20, 2015
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Abstract.  Here, we present platinum and palladium mononuclear complexes with EUV photosensitivity and lithographic performance. Many platinum and palladium complexes show little or no EUV sensitivity; however, we have found that metal carbonates and metal oxalates (L2M(CO3) and L2M(C2O4); M=Pt or Pd) are sensitive to EUV. The metal carbonates give negative-tone behavior. The most interesting result is that the metal oxalates give the first positive-tone EUV resists based on mononuclear organometallic compounds. In particular, (dppm)Pd(C2O4) (dppm=1,1-bis(diphenylphosphino)methane) (23) prints 30-nm dense lines with Esize of 50  mJ/cm2. Derivatives of (23) were synthesized to explore the relationship between the core metal and the resist sensitivity. The study showed that palladium-based resists are more sensitive than platinum-based resists. The photoreaction has been investigated for two of our most promising resists, (dppm)Pd(C2O4) (23) and (Ph2EtP)2PdC2O4 (27). Our experiments suggest the loss of CO2 and the formation of a zerovalent L4Pd complex upon exposure to light. We have identified dppm2Pd(δ(P)23.6) as the main photoproduct for (23) and (Ph2EtP)4Pd (δ(P)32.7) as the main photoproduct for (27).

© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Miriam Sortland ; Jodi Hotalen ; Ryan Del Re ; James Passarelli ; Michael Murphy, et al.
"Platinum and palladium oxalates: positive-tone extreme ultraviolet resists", J. Micro/Nanolith. MEMS MOEMS. 14(4), 043511 (Dec 24, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.4.043511


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