Metrology

Evaluation of the effect of data quality on the profile uncertainty of critical dimension small angle x-ray scattering

[+] Author Affiliations
Daniel F. Sunday, R. Joseph Kline

National Institute of Standards and Technology, Materials Science and Engineering Division, 100 Bureau Drive, Gaithersburg, Maryland 20899, United States

Scott List, Jasmeet S. Chawla

Intel Corporation, Components Research Division, 2501 NW 229th Avenue, Hillsboro, Oregon 97124, United States

J. Micro/Nanolith. MEMS MOEMS. 15(1), 014001 (Jan 06, 2016). doi:10.1117/1.JMM.15.1.014001
History: Received September 25, 2015; Accepted December 3, 2015
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Abstract.  A line grating prepared via a self-aligned quadruple patterning method was measured using critical dimension small angle x-ray scattering. A Monte Carlo Markov chain algorithm was used to analyze the uncertainty of the model fit over subsets of the full angular range and for a time series with decreasing signal-to-noise in order to determine the effect of the data quality on the final profile shape uncertainty. These results show how the total measurement time can be reduced while maintaining satisfactory profile shape uncertainty. We found that the typical measurement conditions are highly oversampled and can be reduced considerably with only marginal effect on the shape uncertainty. A comparison is made between the synchrotron measurements and a laboratory system, demonstrating that both measurements result in similar structures.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Topics

Scattering ; X-rays

Citation

Daniel F. Sunday ; Scott List ; Jasmeet S. Chawla and R. Joseph Kline
"Evaluation of the effect of data quality on the profile uncertainty of critical dimension small angle x-ray scattering", J. Micro/Nanolith. MEMS MOEMS. 15(1), 014001 (Jan 06, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.1.014001


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