JM3 Letters

Low cost batch fabrication of microdevices using ultraviolet light-emitting diode photolithography technique

[+] Author Affiliations
Neam Heng Lee, Narayanan Ramakrishnan

Monash University Malaysia, School of Engineering, Electrical and Computer Systems Engineering Department, Jalan Lagoon Selatan, Bandar Sunway, Selangor 46150, Malaysia

Varghese Swamy

Monash University Malaysia, School of Engineering and Advanced Engineering Platform, Mechanical Engineering Department, Jalan Lagoon Selatan, Bandar Sunway, Selangor 46150, Malaysia

J. Micro/Nanolith. MEMS MOEMS. 15(1), 010501 (Jan 25, 2016). doi:10.1117/1.JMM.15.1.010501
History: Received August 27, 2015; Accepted December 21, 2015
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Abstract.  Solid-state technology has enabled the use of light-emitting diodes (LEDs) in lithography systems due to their low cost, low power requirement, and higher efficiency relative to the traditional mercury lamp. Uniform irradiance distribution is essential for photolithography to ensure the critical dimension (CD) of the feature fabricated. However, light illuminated from arrays of LEDs can have nonuniform irradiance distribution, which can be a problem when using LED arrays as a source to batch-fabricate multiple devices on a large wafer piece. In this study, the irradiance distribution of an UV LED array was analyzed, and the separation distance between light source and mask optimized to obtain maximum irradiance uniformity without the use of a complex lens. Further, employing a diffuser glass enhanced the fabrication process and the CD loss was minimized to an average of 300 nm. To assess the performance of the proposed technology, batch fabrication of surface acoustic wave devices on lithium niobate substrate was carried out, and all the devices exhibited identical insertion loss of 18  dB at a resonance frequency of 39.33 MHz. The proposed low-cost UV lithography setup can be adapted in academic laboratories for research and teaching on microdevices.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Neam Heng Lee ; Varghese Swamy and Narayanan Ramakrishnan
"Low cost batch fabrication of microdevices using ultraviolet light-emitting diode photolithography technique", J. Micro/Nanolith. MEMS MOEMS. 15(1), 010501 (Jan 25, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.1.010501


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