Lithography

Effect of electron beam irradiation on thin metal films on glass surfaces in a submicrometer scale

[+] Author Affiliations
Filipp E. Komissarenko, Alexander O. Golubok, Nikolay V. Nikonorov, Alexander I. Sidorov

ITMO University, Kronverksky Avenue, 49, 197101, St. Petersburg, Russia

Ivan S. Mukhin

ITMO University, Kronverksky Avenue, 49, 197101, St. Petersburg, Russia

St. Petersburg Academic University–Nanotechnology Research and Education Center RAS, Khlopina Street, 8/3, 195220, St. Petersburg, Russia

Mikhail A. Prosnikov

Russian Academy of Sciences, Ioffe Physical-Technical Institute, Polytechnicheskaya Street, 26, 194021, St. Petersburg, Russia

J. Micro/Nanolith. MEMS MOEMS. 15(1), 013502 (Feb 01, 2016). doi:10.1117/1.JMM.15.1.013502
History: Received September 13, 2015; Accepted January 5, 2016
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Abstract.  It is shown experimentally that the irradiation of thin Al and Au films of thickness 50 to 100 nm on a silicate glass surface by electrons results in effects that differ principally depending on the electron energy. For energies of 5 to 15 keV, the irradiation leads to an increase in the film thickness throughout the irradiated zone and a decrease in the thickness in the surrounding area. For an energy of 25 keV, the irradiation leads to dissolving the Au film in glass in the irradiated zone. The mechanisms of the observed effects are discussed.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Filipp E. Komissarenko ; Ivan S. Mukhin ; Alexander O. Golubok ; Nikolay V. Nikonorov ; Mikhail A. Prosnikov, et al.
"Effect of electron beam irradiation on thin metal films on glass surfaces in a submicrometer scale", J. Micro/Nanolith. MEMS MOEMS. 15(1), 013502 (Feb 01, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.1.013502


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