Development of nanoimprint lithography templates toward high-volume manufacturing

Koji Ichimura; Kouji Yoshida; Saburo Harada; Takaharu Nagai; Masaaki Kurihara; Naoya Hayashi

doi:10.1117/1.JMM.15.2.021006

5 February 2016 Development of nanoimprint lithography templates toward high-volume manufacturing

Koji Ichimura, Kouji Yoshida, Saburo Harada, Takaharu Nagai, Masaaki Kurihara, Naoya Hayashi

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 15, Issue 2, 021006 (February 2016). https://doi.org/10.1117/1.JMM.15.2.021006

Abstract

Development of nanoimprint lithography (NIL) templates is discussed. The template fabrication process and its performance are presented with consideration of the requirements of NIL for high-volume manufacturing. Defectivity, image placement, and critical dimension uniformity are the three major performance parameters of the templates, and their current status is shown.

Citation Download Citation

Koji Ichimura, Kouji Yoshida, Saburo Harada, Takaharu Nagai, Masaaki Kurihara, and Naoya Hayashi "Development of nanoimprint lithography templates toward high-volume manufacturing," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(2), 021006 (5 February 2016). https://doi.org/10.1117/1.JMM.15.2.021006

Published: 5 February 2016

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available