Errata

Errata: Viability of pattern shift for defect-free extreme ultraviolet lithography photomasks

[+] Author Affiliations
Zhengqing John Qi

GLOBALFOUNDRIES Inc., 275 Fuller Road, Albany, New York 12203, United States

Jed Rankin

GLOBALFOUNDRIES Inc., 1000 River Street, Essex Junction, Vermont 05452, United States

Eisuke Narita, Masayuki Kagawac

Toppan Photomask Inc., 1000 River Street, Essex Junction, Vermont 05452, United States

J. Micro/Nanolith. MEMS MOEMS. 15(2), 029801 (Feb 15, 2016). doi:10.1117/1.JMM.15.2.029801
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This article [J. Micro/Nanolith. MEMS MOEMS. 15, (2 ), 021005  (2016)] was originally published online on 2 February 2016 with an error in the author affiliations.

The correct affiliations are shown above.

All online versions of the article were corrected on 3 February 2016. The article appears correctly in print.

© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Zhengqing John Qi ; Jed Rankin ; Eisuke Narita and Masayuki Kagawac
"Errata: Viability of pattern shift for defect-free extreme ultraviolet lithography photomasks", J. Micro/Nanolith. MEMS MOEMS. 15(2), 029801 (Feb 15, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.2.029801


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