Special Section on Photomask Manufacturing Technology

Phase imaging results of phase defect using micro-coherent extreme ultraviolet scatterometry microscope

[+] Author Affiliations
Tetsuo Harada, Hiraku Hashimoto, Hiroo Kinoshita, Takeo Watanabe

University of Hyogo, LASTI, Center for EUV Lithography, 1-1-2 NewSUBARU, Kouto, Kamigori, Ako-gun, Hyogo 678-1205, Japan

Tsuyoshi Amano

EUVL Infrastructure Development Center Inc., 16-1 Onogawa, Tsukuba-shi, Ibaraki 305-8569, Japan

J. Micro/Nanolith. MEMS MOEMS. 15(2), 021007 (Feb 18, 2016). doi:10.1117/1.JMM.15.2.021007
History: Received November 5, 2015; Accepted February 4, 2016
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Abstract.  To evaluate defects on extreme ultraviolet (EUV) masks at the blank state of manufacturing, we developed a micro-coherent EUV scatterometry microscope (micro-CSM). The illumination source is coherent EUV light with a 140 nm focus diameter on the defect using a Fresnel zone plate. This system directly observes the reflection and diffraction signals from a phase defect. The phase and the intensity image of the defect are reconstructed with the diffraction images using ptychography, which is an algorithm of the coherent diffraction imaging. We observed programmed phase defect on a blank EUV mask. Phase distributions of these programmed defects were well reconstructed quantitatively. The micro-CSM is a very powerful tool to review an EUV phase defect.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Tetsuo Harada ; Hiraku Hashimoto ; Tsuyoshi Amano ; Hiroo Kinoshita and Takeo Watanabe
"Phase imaging results of phase defect using micro-coherent extreme ultraviolet scatterometry microscope", J. Micro/Nanolith. MEMS MOEMS. 15(2), 021007 (Feb 18, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.2.021007


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