Lithography

Coarse-grained molecular dynamics modeling of the kinetics of lamellar block copolymer defect annealing

[+] Author Affiliations
Andrew J. Peters, Richard A. Lawson, Benjamin D. Nation, Peter J. Ludovice, Clifford L. Henderson

Georgia Institute of Technology, Chemical and Biomolecular Engineering, 311 Ferst Drive NW, Atlanta, Georgia 30332, United States

J. Micro/Nanolith. MEMS MOEMS. 15(1), 013508 (Mar 08, 2016). doi:10.1117/1.JMM.15.1.013508
History: Received April 14, 2015; Accepted January 29, 2016
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Abstract.  State-of-the-art block copolymer (BCP)—directed self-assembly (DSA) methods still yield defect densities orders of magnitude higher than is necessary in semiconductor fabrication despite free-energy calculations that suggest equilibrium defect densities are much lower than is necessary for economic fabrication. This disparity suggests that the main problem may lie in the kinetics of defect removal. This work uses a coarse-grained model to study the rates, pathways, and dependencies of healing a common defect to give insight into the fundamental processes that control defect healing and give guidance on optimal process conditions for BCP-DSA. It is found that bulk simulations yield an exponential drop in defect heal rate above χN30. Thin films show no change in rate associated with the energy barrier below χN50, significantly higher than the χN values found previously for self-consistent field theory studies that neglect fluctuations. Above χN50, the simulations show an increase in energy barrier scaling with 1/2 to 1/3 of the bulk systems. This is because thin films always begin healing at the free interface or the BCP-underlayer interface, where the increased AB contact area associated with the transition state is minimized, while the infinitely thick films cannot begin healing at an interface.

© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Andrew J. Peters ; Richard A. Lawson ; Benjamin D. Nation ; Peter J. Ludovice and Clifford L. Henderson
"Coarse-grained molecular dynamics modeling of the kinetics of lamellar block copolymer defect annealing", J. Micro/Nanolith. MEMS MOEMS. 15(1), 013508 (Mar 08, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.1.013508


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