Metrology

Optical critical dimension metrology for directed self-assembly assisted contact hole shrink

[+] Author Affiliations
Dhairya Dixit, Avery Green, Jun Sung Chun, Michael O’Sullivan, Prasanna Khare, Warren Montgomery, Alain C. Diebold

College of Nanoscale Science & Engineering, 257 Fuller Road, Albany, New York 12203, United States

Erik R. Hosler, Vimal Kamineni

GLOBALFOUNDRIES, 400 Stonebreak Road Extension, Malta, New York 12020, United States

Moshe E. Preil

GLOBALFOUNDRIES, 2600 Great America Way, Santa Clara, California 95054, United States

Nick Keller, Joseph Race

Nanometrics, 550 Buckeye Drive, Milpitas, California 95035, United States

J. Micro/Nanolith. MEMS MOEMS. 15(1), 014004 (Mar 14, 2016). doi:10.1117/1.JMM.15.1.014004
History: Received July 21, 2015; Accepted February 18, 2016
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Abstract.  Directed self-assembly (DSA) is a potential patterning solution for future generations of integrated circuits. Its main advantages are high pattern resolution (10  nm), high throughput, no requirement of high-resolution mask, and compatibility with standard fab-equipment and processes. The application of Mueller matrix (MM) spectroscopic ellipsometry-based scatterometry to optically characterize DSA patterned contact hole structures fabricated with phase-separated polystyrene-b-polymethylmethacrylate (PS-b-PMMA) is described. A regression-based approach is used to calculate the guide critical dimension (CD), DSA CD, height of the PS column, thicknesses of underlying layers, and contact edge roughness of the post PMMA etch DSA contact hole sample. Scanning electron microscopy and imaging analysis is conducted as a comparative metric for scatterometry. In addition, optical model-based simulations are used to investigate MM elements’ sensitivity to various DSA-based contact hole structures, predict sensitivity to dimensional changes, and its limits to characterize DSA-induced defects, such as hole placement inaccuracy, missing vias, and profile inaccuracy of the PMMA cylinder.

© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Dhairya Dixit ; Avery Green ; Erik R. Hosler ; Vimal Kamineni ; Moshe E. Preil, et al.
"Optical critical dimension metrology for directed self-assembly assisted contact hole shrink", J. Micro/Nanolith. MEMS MOEMS. 15(1), 014004 (Mar 14, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.1.014004


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