Special Section on Control of Integrated Circuit Patterning Variance, Part 2: Image Placement, Device Overlay, and Critical Dimension

High-order distortion control using a computational prediction method for device overlay

[+] Author Affiliations
Young-Seog Kang, Jang-Sun Kim, Ju-Hee Shin, Young-Ha Kim, Young-Sun Nam, Young-Sin Choi, Hunhwan Ha, Dong-Han Lee, Jae-il Lee

SAMSUNG Electronics Co., Ltd., San #16, Banwol-Dong, Hwasung, Gyeonggi-Do, Republic of Korea

Cedric Affentauschegg, Jan Mulkens, Umar Rizvi, Rob van der Heijden, Jan Baselmans

ASML Netherlands B.V., P.O. Box 324, 5500 AH Veldhoven, Netherlands

Bernd Geh

Carl Zeiss SMT Inc., c/o ASML Technology Development Center, 2650 West Geronimo Place Chandler, Arizona 85224, United States

Oh-Sung Kwon

ASML Korea Co., Ltd., 25, 5 Gil, Samsung 1 Ro, Hwasung-Si, Gyeonggi-do 445-170, Republic of Korea

J. Micro/Nanolith. MEMS MOEMS. 15(2), 021403 (Mar 29, 2016). doi:10.1117/1.JMM.15.2.021403
History: Received June 9, 2015; Accepted February 16, 2016
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Abstract.  As a result of the continuously shrinking features of the integrated circuit, the overlay budget requirements have become very demanding. Historically, overlay has been performed using metrology targets for process control, and most overlay enhancements were achieved by hardware improvements. However, this is no longer sufficient, and we need to consider additional solutions for overlay improvements in process variation using computational methods. In this paper, we present the limitations of third-order intrafield distortion corrections based on standard overlay metrology and propose an improved method which includes a prediction of the device overlay and corrects the lens aberration fingerprint based on this prediction. For a DRAM use case, we present a computational approach that calculates the overlay of the device pattern using lens aberrations as an additional input, next to the target-based overlay measurement result. Supporting experimental data are presented that demonstrate a significant reduction of the intrafield overlay fingerprint.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Young-Seog Kang ; Cedric Affentauschegg ; Jan Mulkens ; Jang-Sun Kim ; Ju-Hee Shin, et al.
"High-order distortion control using a computational prediction method for device overlay", J. Micro/Nanolith. MEMS MOEMS. 15(2), 021403 (Mar 29, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.2.021403


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