Characterization of charging-induced pattern positioning errors in advanced mask making

Chien-Cheng Chen; Yen-Cheng Ho; Shao-Wen Chang; Chia-Jen Chen; Ta-Cheng Lien; Chih-Cheng Lin; Hsin-Chang Lee; Anthony Yen

doi:10.1117/1.JMM.15.2.021409

3 June 2016 Characterization of charging-induced pattern positioning errors in advanced mask making

Chien-Cheng Chen, Yen-Cheng Ho, Shao-Wen Chang, Chia-Jen Chen, Ta-Cheng Lien, Chih-Cheng Lin, Hsin-Chang Lee, Anthony Yen

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 15, Issue 2, 021409 (June 2016). https://doi.org/10.1117/1.JMM.15.2.021409

Abstract

Charging-induced pattern positioning errors (CIPPEs) from a 50-kV variable-shape e-beam writer on an opaque-MoSi-over-glass mask has been carefully characterized by directly measuring the pattern shifts using a high-accuracy mask registration tool. In addition, the reported behaviors associated with the CIPPEs, exponentially decaying in space and sign flipping with increasing pattern density (PD), another seldom-mentioned error component, behaving like a constant offset in space and becoming stronger with increasing PD, is found. The authors repeat the experiment with a charge dissipation layer coated atop the resist to experimentally explore the origins of these two phenomena and find that the exponential components, removable by the charge dissipating layer (CDL), result from the well-known resist charging effect but the constant offset, remain existing with the CDL, does not. From the result of Monte Carlo simulations, the constant component is speculated to result from blank charging. This finding can give important insights into the model-based charging effect correction as well as the effectiveness of the CDL.

Citation Download Citation

Chien-Cheng Chen, Yen-Cheng Ho, Shao-Wen Chang, Chia-Jen Chen, Ta-Cheng Lien, Chih-Cheng Lin, Hsin-Chang Lee, and Anthony Yen "Characterization of charging-induced pattern positioning errors in advanced mask making," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(2), 021409 (3 June 2016). https://doi.org/10.1117/1.JMM.15.2.021409

Published: 3 June 2016

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available