Lithography

Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology

[+] Author Affiliations
Zachary Levinson, Bruce W. Smith

Rochester Institute of Technology, 168 Lomb Memorial Drive, Rochester, New York 14623, United States

Erik Verduijn, Obert R. Wood, Pawitter Mangat

GLOBALFOUNDRIES, 400 Stone Break Road Extension, Malta, New York 12020, United States

Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla

Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, California 94720, United States

J. Micro/Nanolith. MEMS MOEMS. 15(2), 023508 (Jun 28, 2016). doi:10.1117/1.JMM.15.2.023508
History: Received March 18, 2016; Accepted June 7, 2016
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Abstract.  An approach to image-based EUV aberration metrology using binary mask targets and iterative model-based solutions to extract both the amplitude and phase components of the aberrated pupil function is presented. The approach is enabled through previously developed modeling, fitting, and extraction algorithms. We seek to examine the behavior of pupil amplitude variation in real-optical systems. Optimized target images were captured under several conditions to fit the resulting pupil responses. Both the amplitude and phase components of the pupil function were extracted from a zone-plate-based EUV mask microscope. The pupil amplitude variation was expanded in three different bases: Zernike polynomials, Legendre polynomials, and Hermite polynomials. It was found that the Zernike polynomials describe pupil amplitude variation most effectively of the three.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Zachary Levinson ; Erik Verduijn ; Obert R. Wood ; Pawitter Mangat ; Kenneth A. Goldberg, et al.
"Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology", J. Micro/Nanolith. MEMS MOEMS. 15(2), 023508 (Jun 28, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.2.023508


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