Kafai Lai received his doctorate degree from the University of Texas at Austin in electrical engineering. Since then he has been working on lithography R&D and currently in the IBM Research Division. He has worked on optical imaging modeling and lens characterization, exposure tooling analysis, OPC/RET development, source mask optimization and design technology co-optimization and most recently directed self-assembly lithography. He is also the chair of the 2012-2015 SPIE Optical Microlithography Conference and has been a member of the technical program committee. He has been teaching various short courses in many lithography conferences worldwide since 2005. He has also been the symposium chair for the CSTIC conference in Shanghai since 2009. Moreover, he serves as an editor for Proceedings of SPIE, Proceedings of IEEE, ECS Transactions, the Journal of Advanced Optical Technologies and others, we well as a guest editor for JM3 special sections for the previous two years. Based on his pioneering work in extending optical lithography and source mask optimization, he was appointed Fellow of SPIE and Fellow of OSA, as well as a senior member of IEEE.