Special Section on Alternative Lithographic Technologies V

Optics-free, plasma-based lithography in inorganic resists made up of nanoparticles

[+] Author Affiliations
Santosh Shaw, Kyle J. Miller

Iowa State University, The L. Cademartiri Lab, Materials Science and Engineering, 2240 Hoover Hall, Ames, Iowa 50011, United States

Julien L. Colaux

University of Surrey, Surrey Ion Beam Centre, Nodus Laboratory, Guildford, Surrey GU2 7XH, United Kingdom

Ludovico Cademartiri

Iowa State University, The L. Cademartiri Lab, Materials Science and Engineering, 2240 Hoover Hall, Ames, Iowa 50011, United States

Iowa State University, Chemical and Biological Engineering, 2114 Sweeney Hall, Ames, Iowa 50011, United States

Ames Laboratory, U.S. Department of Energy, Ames, Iowa 50011, United States

J. Micro/Nanolith. MEMS MOEMS. 15(3), 031607 (Sep 06, 2016). doi:10.1117/1.JMM.15.3.031607
History: Received May 31, 2016; Accepted August 15, 2016
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Abstract.  We describe a lithographic approach—nanocrystal plasma polymerization-based lithography—in which colloidal nanocrystal assemblies (CNAs) are used as the inorganic resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs is redispersed, leaving behind the patterned area, similar to what is expected from negative photoresist.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Santosh Shaw ; Kyle J. Miller ; Julien L. Colaux and Ludovico Cademartiri
"Optics-free, plasma-based lithography in inorganic resists made up of nanoparticles", J. Micro/Nanolith. MEMS MOEMS. 15(3), 031607 (Sep 06, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.3.031607


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