Special Section on Alternative Lithographic Technologies V

Realization of large-scale photonic crystal cavity-based devices

[+] Author Affiliations
Amit Kumar Goyal, Hemant Sankar Dutta, Suchandan Pal

Academy of Scientific and Innovative Research, Council of Scientific and Industrial Research-Central Electronics Engineering Research Institute Campus, Pilani, Rajasthan 333031, India

Council of Scientific and Industrial Research-Central Electronics Engineering Research Institute, Opto-electronic Devices Group, Pilani, Rajasthan 333031, India

Sumitra Singh

Council of Scientific and Industrial Research-Central Electronics Engineering Research Institute, Opto-electronic Devices Group, Pilani, Rajasthan 333031, India

Mandeep Kaur, Sudhir Husale

Council of Scientific and Industrial Research-National Physics Laboratory, Dr. KS Krishnan Marg, South Patel Nagar, Pusa, New Delhi 110012, India

J. Micro/Nanolith. MEMS MOEMS. 15(3), 031608 (Sep 08, 2016). doi:10.1117/1.JMM.15.3.031608
History: Received April 27, 2016; Accepted August 23, 2016
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Abstract.  This paper demonstrates an approach for fabricating large-scale photonic crystal (PhC)-based devices using a combination of optical and focused ion beam (FIB) lithography techniques. Optical lithography along with reactive ion etching parameters is optimized to realize the layout of device structure and thereafter FIB milling is optimized to realize the designed PhC structure at those identified locations. At first, with the help of a specially designed mask and using optical lithography along with reactive ion etching, a number of rectangular areas of dimension of 10  μm×20  μm along with input and output waveguides of width 700  nm and thickness of 250  nm have been fabricated. Subsequently, use of FIB milling, a periodic PhC structure of lattice constant of 600 nm, having a hole diameter of 480  nm along with a defect hole diameter of 250  nm have been realized successfully on the selected areas. This method shows a promising application in fabricating PhC structure with device size >1  cm2 at large scale, eliminating the problems of standard nanolithography techniques.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Amit Kumar Goyal ; Hemant Sankar Dutta ; Sumitra Singh ; Mandeep Kaur ; Sudhir Husale, et al.
"Realization of large-scale photonic crystal cavity-based devices", J. Micro/Nanolith. MEMS MOEMS. 15(3), 031608 (Sep 08, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.3.031608


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