Microelectromechanical Systems (MEMS)

Effect of oxygen-doping concentration on electrical properties of silicon oxycarbide films for memory application

[+] Author Affiliations
Da Chen, Shihua Huang

Zhejiang Normal University, Physics Department, No. 688, Yingbin Road, Jinghua City, Zhejiang Province 321004, China

J. Micro/Nanolith. MEMS MOEMS. 15(3), 035005 (Sep 28, 2016). doi:10.1117/1.JMM.15.3.035005
History: Received June 16, 2016; Accepted September 15, 2016
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Abstract.  We first investigate the effect of oxygen-doping concentration on resistive switching (RS) behaviors in SiCxOy, which were prepared by a radio frequency magnetron sputtering at the oxygen partial pressure ranging from 0% to 6%. Bipolar RS behaviors were achieved in all the fabricated devices and all these devices are valence change memories. With the oxygen partial pressure increasing from 0% to 6% (sample-0% has 40 at. % of oxygen), the mean RHRS increases from 4.5 to 64.8  MΩ and then decreases to 1.5  MΩ, indicating that the device exhibits the largest ON/OFF ratio 500 at the oxygen partial pressure of about 2%. Based on the analyses of x-ray photoelectron spectroscopy, fitting current–voltage curves, and resistance–temperature measurements, it is clear that the trap filled limit space charge limited current and a Schottky barrier in the interface of the SiCxOy film and p+-Si are suggested to be dominant in the positive and negative biases, respectively. Most importantly, all devices can keep the data more than 104  s and endure more than 102 continuous cycles, thus confirming the nonvolatile properties.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Da Chen and Shihua Huang
"Effect of oxygen-doping concentration on electrical properties of silicon oxycarbide films for memory application", J. Micro/Nanolith. MEMS MOEMS. 15(3), 035005 (Sep 28, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.3.035005


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