Metrology

Transmission electron microscope calibration methods for critical dimension standards

[+] Author Affiliations
Ndubuisi G. Orji, Ronald G. Dixson, Michael W. Cresswell, Richard A. Allen

National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899-8212, United States

Domingo I. Garcia-Gutierrez

Universidad Autónoma de Nuevo León, UANL, Facultad de Ingeniería Mecánica y Eléctrica, FIME, Avenida Universidad S/N, Ciudad Universitaria, San Nicolás de los Garza, Nuevo León, C.P. 66450, México

Benjamin D. Bunday

SUNY Poly SEMATECH, 257 Fuller Road, Suite 2200 Albany, New York 12203, United States

Michael Bishop

Independent Consultant, 608 Oak Hollow Drive, Kerrville, Texas 78028, United States

John A. Allgair

AWG, 2028 East Ben White Boulevard, #240-2308 Austin, Texas 78741, United States

J. Micro/Nanolith. MEMS MOEMS. 15(4), 044002 (Oct 13, 2016). doi:10.1117/1.JMM.15.4.044002
History: Received July 22, 2016; Accepted September 20, 2016
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Abstract.  One of the key challenges in critical dimension (CD) metrology is finding suitable dimensional calibration standards. The transmission electron microscope (TEM), which produces lattice-resolved images having scale traceability to the SI (International System of Units) definition of length through an atomic lattice constant, has gained wide usage in different areas of CD calibration. One such area is critical dimension atomic force microscope (CD-AFM) tip width calibration. To properly calibrate CD-AFM tip widths, errors in the calibration process must be quantified. Although the use of TEM for CD-AFM tip width calibration has been around for about a decade, there is still confusion on what should be considered in the uncertainty analysis. We characterized CD-AFM tip-width samples using high-resolution TEM and high angle annular dark field scanning TEM and two CD-AFMs that are implemented as reference measurement systems. The results are used to outline how to develop a rigorous uncertainty estimate for TEM/CD-AFM calibration, and to compare how information from the two electron microscopy modes are applied to practical CD-AFM measurements. The results also represent a separate validation of previous TEM/CD-AFM calibration. Excellent agreement was observed.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Ndubuisi G. Orji ; Ronald G. Dixson ; Domingo I. Garcia-Gutierrez ; Benjamin D. Bunday ; Michael Bishop, et al.
"Transmission electron microscope calibration methods for critical dimension standards", J. Micro/Nanolith. MEMS MOEMS. 15(4), 044002 (Oct 13, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.4.044002


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