Metrology

Modeling ellipsometric measurement of three-dimensional structures with rigorous coupled wave analysis and finite element method simulations

[+] Author Affiliations
Samuel O’Mullane, Alain C. Diebold

SUNY Polytechnic Institute, College of Nanoscale Science and Engineering, 257 Fuller Road, Albany, New York 12203, United States

Nick Keller

Nanometrics, Inc., 1550 Buckeye Drive, Milpitas, California 95035, United States

J. Micro/Nanolith. MEMS MOEMS. 15(4), 044003 (Oct 21, 2016). doi:10.1117/1.JMM.15.4.044003
History: Received February 22, 2016; Accepted September 27, 2016
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Abstract.  Using rigorous coupled wave analysis (RCWA) and finite element method (FEM) simulations together, many interesting ellipsometric measurements can be investigated. This work specifically focuses on simulating copper grating structures that are plasmonically active. Looking at near-field images and Mueller matrix spectra, understanding of physical phenomena is possible. A general strategy for combatting convergence difficulties in RCWA simulations is proposed and applied. The example used is a copper cross-grating structure with known slow convergence. Baseline simulations on simple samples are provided for comparison and determination of FEM accuracy.

© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Samuel O’Mullane ; Nick Keller and Alain C. Diebold
"Modeling ellipsometric measurement of three-dimensional structures with rigorous coupled wave analysis and finite element method simulations", J. Micro/Nanolith. MEMS MOEMS. 15(4), 044003 (Oct 21, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.4.044003


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