Metrology

Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference

[+] Author Affiliations
Taher Kagalwala, Alok Vaid, Sridhar Mahendrakar, Michael Lenahan, Fang Fang

GLOBALFOUNDRIES, 400 Stonebreak Road Extension, Malta, New York 12020, United States

Paul Isbester, Aron Cepler, Naren Yellai, Prasad Dasari

Nova Measuring Instruments, Inc., 2055 Gateway Pl, STE 480, San Jose, California 95110, United States

Michael Shifrin, Yoav Etzioni

Nova Measuring Instruments Ltd., P.O. Box 266, Weizmann Science Park, Rehovot 76100, Israel

Cornel Bozdog

ReVera, a Nova Company, 3090 Oakmead Village Drive, Santa Clara, California 95051, United States

J. Micro/Nanolith. MEMS MOEMS. 15(4), 044004 (Oct 25, 2016). doi:10.1117/1.JMM.15.4.044004
History: Received July 22, 2016; Accepted October 4, 2016
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Abstract.  Advanced technology nodes, 10 nm and beyond, employing multipatterning techniques for pitch reduction pose new process and metrology challenges in maintaining consistent positioning of structural features. A self-aligned quadruple patterning (SAQP) process is used to create the fins in FinFET devices with pitch values well below optical lithography limits. The SAQP process bears the compounding effects from successive reactive ion etch and spacer depositions. These processes induce a shift in the pitch value from one fin compared to another neighboring fin. This is known as pitch walking. Pitch walking affects device performance as well as later processes, which work on an assumption that there is consistent spacing between fins. In SAQP, there are three pitch walking parameters of interest, each linked to specific process steps in the flow. These pitch walking parameters are difficult to discriminate at a specific process step by singular evaluation technique or even with reference metrology, such as transmission electron microscopy. We will utilize a virtual reference to generate a scatterometry model to measure pitch walk for SAQP process flow.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Taher Kagalwala ; Alok Vaid ; Sridhar Mahendrakar ; Michael Lenahan ; Fang Fang, et al.
"Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference", J. Micro/Nanolith. MEMS MOEMS. 15(4), 044004 (Oct 25, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.4.044004


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