Lithography

Large area gratings by x-ray LIGA dynamic exposure for x-ray phase-contrast imaging

[+] Author Affiliations
Tobias J. Schröter, Frieder Koch, Pascal Meyer, Martin Baumann, Daniel Münch, Danays Kunka, Jürgen Mohr

Karlsruhe Institute of Technology, Institute of Microstructure Technology, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany

Sabine Engelhardt, Marcus Zuber, Tilo Baumbach

Karlsruhe Institute of Technology, Institute for Photon Science and Synchrotron Radiation, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany

Karlsruhe Institute of Technology, Laboratory for Applications of Synchrotron Radiation, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany

J. Micro/Nanolith. MEMS MOEMS. 16(1), 013501 (Jan 12, 2017). doi:10.1117/1.JMM.16.1.013501
History: Received November 3, 2016; Accepted December 22, 2016
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Abstract.  X-ray differential phase-contrast imaging (DPCI) using a Talbot–Lau interferometer at a conventional tube source has continuously found applications since its first demonstration. It requires high aspect ratio grating structures with a feature size in the micrometer range that are fabricated using lithographie, galvanik und abformung technology. To overcome the current limitation in grating area, an exposure strategy—continuous exposure—has been developed. In this case, the mask is fixed in respect to the synchrotron beam and only the substrate is scanned. Thus, the grating area is given by the scanning length which is much larger than the actual mask size. The design, needs, and tolerances to adopt this process of dynamic exposure will be described. Furthermore, the first tests using this method will be presented. Gratings with a metal aspect ratio of 11 and a period of 10  μm were fabricated on an area of 165  mm×65  mm. First imaging results demonstrate the suitability of this method. No differences in the visibility or in x-ray image compared to gratings fabricated by the standard method could be found.

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© 2017 Society of Photo-Optical Instrumentation Engineers

Citation

Tobias J. Schröter ; Frieder Koch ; Pascal Meyer ; Martin Baumann ; Daniel Münch, et al.
"Large area gratings by x-ray LIGA dynamic exposure for x-ray phase-contrast imaging", J. Micro/Nanolith. MEMS MOEMS. 16(1), 013501 (Jan 12, 2017). ; http://dx.doi.org/10.1117/1.JMM.16.1.013501


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