Errata

Errata: Fabrication of through-silicon via arrays by photo-assisted electrochemical etching and supercritical electroplating

[+] Author Affiliations
Ho-Chiao Chuang, Hsi-Min Yang, Cheng-Xiang Wu, Jorge Sanchez, Jenq-Huey Shyu

National Taipei University of Technology, Department of Mechanical Engineering, Taipei, Taiwan

J. Micro/Nanolith. MEMS MOEMS. 16(1), 019801 (Feb 16, 2017). doi:10.1117/1.JMM.16.1.019801
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This article [J. Micro/Nanolith. MEMS MOEMS. 16, , 014501  (2017)] was originally published with an error in the title.

The term “through-silicon” appeared as “though-silicon.” All online versions of the article were corrected on 06 February 2017. The article appears correctly in print.

© 2017 Society of Photo-Optical Instrumentation Engineers

Citation

Ho-Chiao Chuang ; Hsi-Min Yang ; Cheng-Xiang Wu ; Jorge Sanchez and Jenq-Huey Shyu
"Errata: Fabrication of through-silicon via arrays by photo-assisted electrochemical etching and supercritical electroplating", J. Micro/Nanolith. MEMS MOEMS. 16(1), 019801 (Feb 16, 2017). ; http://dx.doi.org/10.1117/1.JMM.16.1.019801


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