Lithography

Wavefront aberration of plane diffraction gratings fabricated in a Lloyd’s mirror interferometer

[+] Author Affiliations
Donghan Ma, Shiwei Wang, Lijiang Zeng

Tsinghua University, State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Beijing, China

J. Micro/Nanolith. MEMS MOEMS. 16(2), 023503 (May 22, 2017). doi:10.1117/1.JMM.16.2.023503
History: Received January 24, 2017; Accepted April 21, 2017
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Abstract.  A Lloyd’s mirror interferometer is widely used in holographic lithography to fabricate gratings. Adjustment errors of the interferometer and manufacturing errors of optical elements will both influence the wavefront aberration of a grating. We analyze their influence and propose a method to optimize the wavefront aberration. The correctness of the simulation and the feasibility of the adjustment method are experimentally verified. With this method, low-aberration gratings can be fabricated in a Lloyd’s mirror interferometer.

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© 2017 Society of Photo-Optical Instrumentation Engineers

Citation

Donghan Ma ; Shiwei Wang and Lijiang Zeng
"Wavefront aberration of plane diffraction gratings fabricated in a Lloyd’s mirror interferometer", J. Micro/Nanolith. MEMS MOEMS. 16(2), 023503 (May 22, 2017). ; http://dx.doi.org/10.1117/1.JMM.16.2.023503


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