Lithography

Image-based pupil plane characterization via a space-domain basis

[+] Author Affiliations
Zac Levinson, Andrew Burbine, Bruce W. Smith

Rochester Institute of Technology, Rochester, New York, United States

Erik Verduijn, Obert Wood

GlobalFoundries, Malta, New York, United States

Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla

Lawrence Berkeley National Laboratory, Berkeley, California, United States

J. Micro/Nanolith. MEMS MOEMS. 16(2), 023509 (Jun 19, 2017). doi:10.1117/1.JMM.16.2.023509
History: Received October 3, 2016; Accepted May 31, 2017
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Abstract.  Aberration characterization plays a critical role in the development of any optical system. State-of-the-art lithography systems have the tightest aberration tolerances. We present an approach to image-based pupil plane amplitude and phase characterization using models built with a space-domain basis, in which aberration effects are separable. A polynomial model is constructed between the projections of the image intensity for chosen binary mask targets onto this basis and pupil amplitude or phase variation. This method separates model building and pupil characterization into two distinct steps, thus enabling rapid pupil characterization following data collection. The basis is related to both the transmission cross-coefficient function and the principal components of the image intensity. The pupil plane variation of a zone-plate lens from the Semiconductor High-NA Actinic Reticle Review Project (SHARP) at Lawrence Berkeley National Laboratory is examined using this method. Results are compared to pupil plane characterization using a previously proposed methodology where inverse solutions are obtained through an iterative process involving least-squares regression.

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© 2017 Society of Photo-Optical Instrumentation Engineers

Citation

Zac Levinson ; Andrew Burbine ; Erik Verduijn ; Obert Wood ; Kenneth A. Goldberg, et al.
"Image-based pupil plane characterization via a space-domain basis", J. Micro/Nanolith. MEMS MOEMS. 16(2), 023509 (Jun 19, 2017). ; http://dx.doi.org/10.1117/1.JMM.16.2.023509


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