Presentation
13 June 2022 Strongly-segregating chemically tailored polystyrene-b-polymethacrylates for sub-10 nm patterning
Teruaki Hayakawa, Shinsuke Maekawa, Yasunari Yoshimura, Lei Dong, Yuta Nabae, Takehiro Seshimo, Takahiro Dazai, Kazufumi Sato
Author Affiliations +
Abstract
We have developed strongly-segregating chemically tailored block copolymers (BCPs), a series of post-functionalized polystyrene-b-polymethacrylates capable of forming sub-10 nm perpendicular lamellae on thin films with ease by thermal annealing. The desired block copolymers based on polystyrene-b-polymethacrylates were successfully synthesized by the post-functionalization of poly(glycidyl methacrylate)s and thiol derivatives via thiol-epoxy reaction. To work towards clarifying the essential key to the perpendicular orientation of microdomains, we studied the correlation between the primary structures based on the new concept of molecular design and microphase-separated nanostructures in bulk and thin films.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Teruaki Hayakawa, Shinsuke Maekawa, Yasunari Yoshimura, Lei Dong, Yuta Nabae, Takehiro Seshimo, Takahiro Dazai, and Kazufumi Sato "Strongly-segregating chemically tailored polystyrene-b-polymethacrylates for sub-10 nm patterning", Proc. SPIE PC12054, Novel Patterning Technologies 2022, PC1205406 (13 June 2022); https://doi.org/10.1117/12.2618062
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KEYWORDS
Optical lithography

Thin films

Annealing

Scanning electron microscopy

Lithography

Transmission electron microscopy

Polymerization

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