Yield Improvement With Pellicalised Masks In Projection Printing Technology

A. Rangappan; Chuck Kao

doi:10.1117/12.933560

13 September 1982 Yield Improvement With Pellicalised Masks In Projection Printing Technology

A. Rangappan, Chuck Kao

Proceedings Volume 0334, Optical Microlithography I: Technology for the Mid-1980s; (1982) https://doi.org/10.1117/12.933560
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

Photomask limited yields in LSI and VLSI processes are examined in this paper. Mask defects are classified into two catagories i.e., soft and hard mask defects. Theoretical modelling indicates a substantial yield improvement with pellicle protected masks. In 1:1 projection technology soft mask defects are the predominent cause of mask limited yield. Use of pellicles eliminates the effect of soft defects up to 100 microns in size, does not cause a degradation of image quality or dimensional control, prolongs mask life, and saves considerable labour and cost in maintaining high quality masks. Pellicle mounting, inspection, and handling techniques used are described. Very large die with 3 micron, NMOS, Si-gate technology are used to determine the actual yield improvement. Lots were processed using identical sets of masks of which one set was pellicle protected. Defect density at each process step and final probe yield are statistically analysed to show the individual contributions of hard mask defects, soft mask defects, and random process defects to the overall device yield. Actual yield increase data is presented. This pellicle technology is directly applicable to 10:1 stepping exposure systems where high soft mask defect density could be a more severe problem than in 1:1 projection systems.

Citation Download Citation

A. Rangappan and Chuck Kao "Yield Improvement With Pellicalised Masks In Projection Printing Technology", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); https://doi.org/10.1117/12.933560

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available