Influence of technological conditions on optical and structural properties of molybdenum oxide thin films

Taras T. Kovaliuk; Mykhailo M. Solovan; Orest A. Parfenyuk; Viktor V. Brus; Ivan P. Koziarskyi; Pavlo D. Maryanchuk

doi:10.1117/12.2304772

18 January 2018 Influence of technological conditions on optical and structural properties of molybdenum oxide thin films

Taras T. Kovaliuk, Mykhailo M. Solovan, Orest A. Parfenyuk, Viktor V. Brus, Ivan P. Koziarskyi, Pavlo D. Maryanchuk

Author Affiliations +

Proceedings Volume 10612, Thirteenth International Conference on Correlation Optics; 1061210 (2018) https://doi.org/10.1117/12.2304772
Event: Thirteenth International Conference on Correlation Optics, 2017, Chernivtsi, Ukraine

Abstract

MoO_x thin films were deposited are deposited by DC reactive magnetron sputtering at different technological conditions. Structural, electrical and optical properties of the thin films were investigated. Temperature dependences of the resistance R of the MoO_x films were measured within the temperature range T ÷ 295-420 K. There was established that all samples under investigation had n-type of conductivity. Based on the dependences α² = f(hν ), the presence of direct allowed interband optical transitions in the MoO_x thin films is established and the optical band gap values are determined.

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Taras T. Kovaliuk, Mykhailo M. Solovan, Orest A. Parfenyuk, Viktor V. Brus, Ivan P. Koziarskyi, and Pavlo D. Maryanchuk "Influence of technological conditions on optical and structural properties of molybdenum oxide thin films", Proc. SPIE 10612, Thirteenth International Conference on Correlation Optics, 1061210 (18 January 2018); https://doi.org/10.1117/12.2304772

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