EUV photolithography mask inspection using Fourier ptychography

Antoine Wojdyla; Markus P. Benk; Patrick P. Naulleau; Kenneth A. Goldberg

doi:10.1117/12.2307860

29 May 2018 EUV photolithography mask inspection using Fourier ptychography

Antoine Wojdyla, Markus P. Benk, Patrick P. Naulleau, Kenneth A. Goldberg

Proceedings Volume 10656, Image Sensing Technologies: Materials, Devices, Systems, and Applications V; 106560W (2018) https://doi.org/10.1117/12.2307860
Event: SPIE Commercial + Scientific Sensing and Imaging, 2018, Orlando, FL, United States

Abstract

Fourier ptychography is a computational imaging techniques that combines various full-field coherent images acquired under varied illumination angles and combined to yield a angular spectrum with a large synthetic numerical aperture and non-interferometric phase information. We present here the implementation of this technique in a full-field soft x-ray microscope designed to emulate modern EUV lithography tools imaging conditions, and we show that this technique can be used for the study of EUV photomasks. The technique allows us to quantitatively characterize phase defects (predominant in EUV lithography), to study new mask designs made of phase structures, to study sub-resolution assist features and extend the resolution of the microscope down to 26-nm, correspond to the N1 technology node.

Conference Presentation

Citation Download Citation

Antoine Wojdyla, Markus P. Benk, Patrick P. Naulleau, and Kenneth A. Goldberg "EUV photolithography mask inspection using Fourier ptychography", Proc. SPIE 10656, Image Sensing Technologies: Materials, Devices, Systems, and Applications V, 106560W (29 May 2018); https://doi.org/10.1117/12.2307860

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