Material design for the improvement of ZEP520A performance

A. Nakajima; T. Kozawa; M. Hoshino; M. Hashimoto

doi:10.1117/12.2501648

3 October 2018 Material design for the improvement of ZEP520A performance

A. Nakajima, T. Kozawa, M. Hoshino, M. Hashimoto

Proceedings Volume 10810, Photomask Technology 2018; 108100O (2018) https://doi.org/10.1117/12.2501648
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States

Abstract

We investigated the effects of molecular weight distribution (molecular weight and dispersity) and developer on the sensitivity and resolution of ZEP series (Zeon Corporation). ZEP520A, ZEP7000, and ZEP530A(under development) are scission-type polymer resists composed of the same structural unit with different molecular weight and dispersity. The sensitivities of ZEP530A (narrow dispersity) and ZEP7000 (high molecular weight) are approximately same and lower than ZEP520A (standard). The resolution of ZEP530A was the highest among the ZEP series.

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Citation Download Citation

A. Nakajima, T. Kozawa, M. Hoshino, and M. Hashimoto "Material design for the improvement of ZEP520A performance", Proc. SPIE 10810, Photomask Technology 2018, 108100O (3 October 2018); https://doi.org/10.1117/12.2501648

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