An Analytical Model For The Aerial Image Simulation Of 2-D Mask Structures. Optimization Of The ODB Tapering Method

Marco I. Buraschi; Renzo Traversini

doi:10.1117/12.953166

25 July 1989 An Analytical Model For The Aerial Image Simulation Of 2-D Mask Structures. Optimization Of The ODB Tapering Method

Marco I. Buraschi, Renzo Traversini

Author Affiliations +

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953166
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

An analytical model for 2-D non periodic aerial image simulation is proposed for rectangular and circular mask structures. As applications we demonstrate that better resolution in contact opening is acheivable if near circular pattern are designed at mask level. Examples of optimized aerial image for ODB tapering method are shown. Influence of defects on the reticle are considered.

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Marco I. Buraschi and Renzo Traversini "An Analytical Model For The Aerial Image Simulation Of 2-D Mask Structures. Optimization Of The ODB Tapering Method", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953166

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