Spectroscopic reflectometry in the extreme ultraviolet for critical dimension metrology

Lukas Bahrenberg; Serhiy Danylyuk; Robert Michels; Sven Glabisch; Moein Ghafoori; Sascha Brose; Jochen Stollenwerk; Peter Loosen

doi:10.1117/12.2513173

26 March 2019 Spectroscopic reflectometry in the extreme ultraviolet for critical dimension metrology

Lukas Bahrenberg, Serhiy Danylyuk, Robert Michels, Sven Glabisch, Moein Ghafoori, Sascha Brose, Jochen Stollenwerk, Peter Loosen

Author Affiliations +

Proceedings Volume 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII; 109591X (2019) https://doi.org/10.1117/12.2513173
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

The authors report on critical dimension metrology on nanoscale gratings by means of laboratory-based spectroscopic reflectometry in the extreme ultraviolet (EUV). EUV reflectivity spectra of nanoscale gratings under grazing incidence illumination and their dependency on the geometrical grating parameters are discussed. A laboratory-based setup to measure such spectra is introduced and its main features are presented. A nanoscale grating with a grating period below 100 nm, consisting of multiple nanometer-size layers of materials, is experimentally investigated in the setup. The experimental results are consequently compared to a rigorous model fit of the reflectivity and thus the ability to model the grating’s interaction with EUV radiation is shown.

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Lukas Bahrenberg, Serhiy Danylyuk, Robert Michels, Sven Glabisch, Moein Ghafoori, Sascha Brose, Jochen Stollenwerk, and Peter Loosen "Spectroscopic reflectometry in the extreme ultraviolet for critical dimension metrology", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109591X (26 March 2019); https://doi.org/10.1117/12.2513173

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