Paper
18 December 2018 Design and preparation of polymer-based microspectrometer using laser lithography
D. Jandura, M. Markotan, D. Pudis
Author Affiliations +
Proceedings Volume 10976, 21st Czech-Polish-Slovak Optical Conference on Wave and Quantum Aspects of Contemporary Optics; 109760U (2018) https://doi.org/10.1117/12.2518354
Event: 21st Czech-Polish-Slovak Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 2018, Lednice, Czech Republic
Abstract
In this paper, we present design and preparation of polymer components for microspectrometer fabrication on a chip. The graphical program was used to design novel components in 3D arrangement. In experimental we used two-photon polymerization for direct laser writing of designed structures in IP-Dip photoresist material. Shape and morphological properties of prepared devices were investigated by scanning electron microscope (SEM). Finally, optical properties were examined by diffraction measurements.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. Jandura, M. Markotan, and D. Pudis "Design and preparation of polymer-based microspectrometer using laser lithography", Proc. SPIE 10976, 21st Czech-Polish-Slovak Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 109760U (18 December 2018); https://doi.org/10.1117/12.2518354
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KEYWORDS
Waveguides

Mirrors

Diffraction gratings

Photoresist materials

Polymers

Lithography

Scanning electron microscopy

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