Novel monitoring of EUV litho cluster for manufacturing insertion

Vincent Truffert; Kit Ausschnitt; Vineet V. Nair; Koen D'Havé

doi:10.1117/12.2551881

23 March 2020 Novel monitoring of EUV litho cluster for manufacturing insertion

Vincent Truffert, Kit Ausschnitt, Vineet V. Nair, Koen D'Havé

Proceedings Volume 11323, Extreme Ultraviolet (EUV) Lithography XI; 113230S (2020) https://doi.org/10.1117/12.2551881
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Sustaining optimum EUV litho-cluster performance requires monitoring the dimensional variance of representative patterns at high speed and sampling density. We present NXE3400 monitoring results obtained with an optical technique whose amplified sensitivity to dimensional variance increases with decreasing pitch. The scalable technique enables quantitative tracking of site-to-site pattern profile and fidelity and it is applied here on 5nm-node-relevant EUV dense features (line/space width, line/space ends in elongated contact holes). We benchmark against conventional monitoring methods to demonstrate capability improvements. We finally introduce complementary methods which enable a robust manufacturing insertion of EUV technology; such as 2-dimensional feature monitoring and stochastic defect prediction.

Conference Presentation

Citation Download Citation

Vincent Truffert, Kit Ausschnitt, Vineet V. Nair, and Koen D'Havé "Novel monitoring of EUV litho cluster for manufacturing insertion", Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113230S (23 March 2020); https://doi.org/10.1117/12.2551881

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