Electron beam mask writer EBM-8000P for high throughput mask production

Tomohiro Iijima; Satoshi Nakahashi; Ryo Iikubo; Takahiro Honbu; Shinsuke Nishimura; Syoji Mori; Hirohiko Honda; Tsuyoshi Yamashita; Tetsurou Nishiyama; Osamu Kawami; Takao Tamura; Kenji Ohtoshi; Hirokazu Yamada

doi:10.1117/12.2552447

23 March 2020 Electron beam mask writer EBM-8000P for high throughput mask production

Tomohiro Iijima, Satoshi Nakahashi, Ryo Iikubo, Takahiro Honbu, Shinsuke Nishimura, Syoji Mori, Hirohiko Honda, Tsuyoshi Yamashita, Tetsurou Nishiyama, Osamu Kawami, Takao Tamura, Kenji Ohtoshi, Hirokazu Yamada

Author Affiliations +

Proceedings Volume 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020; 113241B (2020) https://doi.org/10.1117/12.2552447
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

The high-throughput EBM-mask writer, EBM-8000P has been developed for mature node mask market. The EBM-8000P inherits basic architectures from the previous EBM-8000 system, i.e. electron optics with 50kV acceleration voltage, 400A/cm² current density, variable shaped beam (VSB), and also, user interface such as JOB control system, mask handling system, which are equivalent to our latest single electron beam mask writers.

The EBM-8000P has two models, the EBM-8000P/H, which is equivalent to the conventional EBM-8000, and the EBM-8000P/M, which aims for high throughput.

The mask-writing throughput depends largely on the beam shot size and the current density, based on the generation of mask nodes. The EBM-8000P/M achieves high throughput and enough accuracy for 45-20 node by enlarging the maximum shot size while maintaining a current density of 400A/cm².

Therefore, it is possible to achieve throughput that is 1.5 to 2 times faster than the conventional 70A/cm² mask writer (such as EBM-6000) which is for 45-20nm node.

Citation Download Citation

Tomohiro Iijima, Satoshi Nakahashi, Ryo Iikubo, Takahiro Honbu, Shinsuke Nishimura, Syoji Mori, Hirohiko Honda, Tsuyoshi Yamashita, Tetsurou Nishiyama, Osamu Kawami, Takao Tamura, Kenji Ohtoshi, and Hirokazu Yamada "Electron beam mask writer EBM-8000P for high throughput mask production", Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113241B (23 March 2020); https://doi.org/10.1117/12.2552447

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available