Novel overlay correction using inline alignment station (iAS) for scanner

Takahisa Kikuchi; Ayako Sugimoto; Shigeru Eto; Akira Okutomi; Naoki Morita

doi:10.1117/12.2551973

23 March 2020 Novel overlay correction using inline alignment station (iAS) for scanner

Takahisa Kikuchi, Ayako Sugimoto, Shigeru Eto, Akira Okutomi, Naoki Morita

Proceedings Volume 11327, Optical Microlithography XXXIII; 113270W (2020) https://doi.org/10.1117/12.2551973
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Demand for on-product overlay (OPO) improvement is becoming increasingly crucial in semiconductor manufacturing. Alignment sampling plan is closely linked to OPO. However, alignment sampling plan is constrained by productivity. Inline Alignment Station (iAS) is the groundbreaking system which enable dense alignment without throughput impact. Remaining linear and high order grid of OPO can be corrected with iAS correction. iAS is a measurement tool placed inline with NSR and has its own measurement stage. Therefore, it is possible to measure dense sampling without throughput impact. However, matching two stages generally pose some difficulties. Chucking deformation of wafer is one of the challenging factors. We have overcome the problem by integrating new methods. In this paper, we introduce the detail of the method and show some actual results.

Conference Presentation

Citation Download Citation

Takahisa Kikuchi, Ayako Sugimoto, Shigeru Eto, Akira Okutomi, and Naoki Morita "Novel overlay correction using inline alignment station (iAS) for scanner", Proc. SPIE 11327, Optical Microlithography XXXIII, 113270W (23 March 2020); https://doi.org/10.1117/12.2551973

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