Process variation-aware mask optimization with iterative improvement by subgradient method and boundary ﬂipping

Rina Azuma; Yukihide Kohira; Tomomi Matsui; Atsushi Takahashi; Chikaaki Kodama

doi:10.1117/12.2552514

23 March 2020 Process variation-aware mask optimization with iterative improvement by subgradient method and boundary ﬂipping

Rina Azuma, Yukihide Kohira, Tomomi Matsui, Atsushi Takahashi, Chikaaki Kodama

Author Affiliations +

Proceedings Volume 11328, Design-Process-Technology Co-optimization for Manufacturability XIV; 113280O (2020) https://doi.org/10.1117/12.2552514
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

As one of Resolution Enhancement Techniques, a mask optimization such as Pixel-based Optical Proximity Correction or Inverse Lithography Technology is well discussed. In this paper, a pixel-based mask optimization using 0-1 Quadratic Programming problem (0-1 QP) is proposed to obtain enough image contour fidelity and tolerance to process variation in a short time. By formulating 0-1 QP to maximize intensity slope around between edges of target patterns, suppression of image contour distortion by the process variation is realized. The defined 0-1 QP is relaxed into Lagrangian relaxation problem and an approximate solution of the defined 0-1 QP is obtained by solving Lagrangian relaxation problem by using Subgradient method and gradient deciding method. Moreover, by applying a correction method which corrects boundary pixel of target patterns precisely into the mask obtained by 0-1 QP, enough shape fidelity toward target patterns can be obtained.

Conference Presentation

Citation Download Citation

Rina Azuma, Yukihide Kohira, Tomomi Matsui, Atsushi Takahashi, and Chikaaki Kodama "Process variation-aware mask optimization with iterative improvement by subgradient method and boundary ﬂipping", Proc. SPIE 11328, Design-Process-Technology Co-optimization for Manufacturability XIV, 113280O (23 March 2020); https://doi.org/10.1117/12.2552514

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