Pixelization effect in SEM images: investigating the effect of the selected pixel size on LER measurement

George Papavieros; Vassilios Constantoudis; Evangelos Gogolides

doi:10.1117/12.2592175

22 February 2021 Pixelization effect in SEM images: investigating the effect of the selected pixel size on LER measurement

George Papavieros, Vassilios Constantoudis, Evangelos Gogolides

Author Affiliations +

Proceedings Volume 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV; 116111C (2021) https://doi.org/10.1117/12.2592175
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

In this paper, we focus on the across-edges pixelization effects on LER measurement accuracy. The pixelization across edges rounds the detected edge position according to pixel size and is expected to impact the accuracy of LER measurements (rms, correlation length, PSD curve). Given the similar size of targeted LER values in IRDS and of the pixel size used in SEM measurements, these effects are expected to gain an increasing interest and therefore to be worth studying. Our investigation is utilized with the aid of synthesized images (characterized by complete control of roughness and image parameters), with the final aim being the exploration of the link between the selected pixel size of the SEM image and the observed deviation of the measured rms (rms_m) from the true rms value (rms_t). More specifically, the goal is to find the role of the ratio of pixel size to rms_t in the measurement of rms and how we can predict it.

Conference Presentation

Citation Download Citation

George Papavieros, Vassilios Constantoudis, and Evangelos Gogolides "Pixelization effect in SEM images: investigating the effect of the selected pixel size on LER measurement", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 116111C (22 February 2021); https://doi.org/10.1117/12.2592175

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